Dr.Bhavana N. Joshi

Growth and characterization of Low-k Dielectric Thin Films for VLSI Applications

Dr.Yogesh Mhaisagar

Surface modification and electrical characterization of porous low-k thin film for nanoelectronics applications

Dr.Ravindrakumar G. Bavane

"Synthesis and characterization of thin films of conducting polymer for gas sensing applications"

Dr.Anil G. Khairnar

"Development of novel metal gate/high-k/Ge stacked structures for high mobility channel MOSFETs"

Dr. Anil S. Gaikwad

"Synthesis and Characterization of Silica Aerogel Thin Films As Inter Layer Dielectrics (ILD) In ULSI Circuits."

Dr. Vilas S. Patil

"Structural and Electrical Characterization of Atomic Layer Deposition (ALD)system deposited high-k dieletric thin flim based MOS devices"

Dr.Khushabu S. Agrawal

"Deposition of rare earth oxides by ALD and its applications for alternative gate stack devices

Dr. Viral N. Barhate

"comparative study of PEALD deposited high-k dieletric thin flims for ULSI application."

Dr. Swati Gupta

"Investigation of Nanoporous Low-k Dieletric thin flims:A Comparative Study."

Dr. Sumit Ramdas Patil

"Investigation of Novel High-k Nanolaminates of MIM capacitors."