Publications with Impact Factor


1.	Vilas S. Patil, Khushabu S. Agrawal, Anil G. Khairnar, Brian J. Thibeault and Ashok M. Mahajan "Structural and Electrical Properties of Ultra-Thin High-k ZrO2 Film on Nitride Passivated Ge (100) Prepared by PEALD" accepted to Materials Science in Semiconductor Processing (Elsevier)  (2016) IF - 2.26.

2.	Namrata B. Pawar , Yogesh S. Mhaisagar , Anil S. Gaikwad and Ashok M. Mahajan "Influence of solvent variation on Tween-80 porogen based low-k thin films" accepted to Silicon (Springer) (2016) IF - 1.06.

3.	Anil G. Khairnar, Vilas S. Patil, Khushabu S. Agrawal, Rahul S. Salunke and Ashok M. Mahajan, PEALD growth high-k ZrO2 thin films on SiC compound semiconductor accepted for publication in Semiconductor (Springer) (2016), IF-0.70.

4.	Anil S. Gaikwad, Swati A. Gupta and Ashok M. Mahajan, "Influence of HF acid catalyst concentration on properties of aerogel low-k thin films", Materials Research Express (IOP) 3, 086403 (2016) IF - 0.98.

5.	Yogesh S. Mhaisagar, Anil S. Gaikwad, Anil G. Khairnar and Ashok M. Mahajan "Enhancement in mechanical properties of silica low-k thin films by using wet chemical technique", Indian Journal of Pure & Applied Physics, 54, 439-442, (2016) IF - 0.7. 

6.	Anil Gaikwad, Yogesh Mhaisagar and Ashok Mahajan "Synthesis and characterization of silica aerogel thin films", Invertis Journal of Science & Technology, 9(1), 54-61 (2016).

7.	Khushabu S. Agrawal, Vilas S. Patil, Anil G. Khairnar and Ashok M. Mahajan "HfO2 gate dielectric on Ge(111) with ultrathin nitride interfacial layer formed by rapid thermal NH3 treatment" Applied Surface Science, 364, 747-751, (2016), IF- 3.1.

8.	A. M. Mahajan, Anil G. Khairnar, Brian J. Thibeault, "Fabrication of ALD-ZrO2/n-Ge MOS capacitors with Pt/Ti bilayer metal electrodes for advanced CMOS devices", Silicon, 8 (3), 345-350 (2016) IF - 1.06. 

9.	A. G. Khairnar, L. S. Patil, R. S. Salunke and A. M. Mahajan, "Electrical properties of HfO2 high-k thin film MOS capacitor for advanced CMOS technology" Indian Journal of Physics (Springer), 89(11), 1177-1181 (2015) IF- 1.166

10.	Yogesh S. Mhaisagar, Bhavana N. Joshi and A.M. Mahajan, "Mechanical properties of surface modified silica low-k thin films", Microelectronics Engineering, 114, 112-116 (2014) IF- 1.277.

11.	A. M. Mahajan, Anil G. Khairnar, Brian J. Thibeault "Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon" Semiconductors (Springer), 48 (4) (2014) IF- 0.70.

12.	Yogesh S. Mhaisagar, Bhavana N. Joshi and A. M. Mahajan, "Synthesis of SiOF nanoporous Ultra low-k thin film", Journal of Material Science: Materials in Electronics 24 (12), 4964-4969 (2013) IF- 1.48.

13.	Anil G. Khairnar Y. S. Mhaisagar and A. M. Mahajan "Synthesis of Cerium Dioxide High-k Thin Films as a Gate Dielectric in MOS Capacitor", J. Nano- Electron. Phys. 5(3), 2013, 03002-1-03002-3.

14.	R.G. Bavane, A. M. Mahajan, M. D. Shirsat, R.B. Gore, "Ammonia Gas Sensing Characteristics of Spin Coated Polyaniline Films", Journal of Advances in Physics 3 (3), 241-248 (2013) IF- 1.43.

15.	Bhavana N. Joshi and A.M. Mahajan "Monomer methyl methacrylate (MMA) incorporated hybrid low-k thin films", Electronic Materials Letters 9 (6), 723-728 (2013) IF-2.05.

16.	Anil G. Khairnar, Y.S. Mhaisagar, A.M. Mahajan "Surface Passivation of Germanium Using   in RTP for High Mobility MOS Structure", Journal of Nano and Electronics Physics, 5 (2013).

17.	 Anil G. Khairnar and Ashok M. Mahajan "Effect of post-deposition annealing temperature on RF-Sputtered HfO2 thin film for advanced CMOS technology", Solid State Sciences, 15, 24-27 (2013) IF- 2.04. 

18.	Anil G. Khairnar and A. M. Mahajan, "Sol-Gel Deposited Ceria Thin Films as Gate Dielectric for CMOS Technology", Bulletin of Material Science, 36, 259-263 (2013) IF-0.89.

19.	Yogesh S. Mhaisagar and A.M. Mahajan, "Sol-Gel Deposited Porogen Based Porous Low-k Thin Films for Interlayer Dielectric Application in ULSI Circuits", Journal of Nano and Electronics Physics, 4, (2012).

20.	Yogesh S. Mhaisagar, Bhavana N. Joshi and A. M. Mahajan, "Surface texture modification of spin coated SiO2 xerogel thin films by TMCS silylation", Bulletin of Material Science, 35 , 151-155 (2012) IF- 0.89.

21.	Yogesh S. Mhaisagar, Renuka Kawishwar, Bhavana N. Joshi, and A.M. Mahajan, Deposition of porous low-k thin films using Tween 80 porogen for ILD application in  ULSI circuits" SPIE Proceedings, 8549, 85493K-1 (2012) IF- 0.37.

22.	Pravin M. Tirmali, Anil G. Khairnar, Bhavana N. Joshi and Ashok M. Mahajan, "Structural and electrical characteristics of RF-sputtered HfO2 high-k based MOS capacitors", Solid state Electronics, 62, 44-47 (2011) IF- 1.34.

23.	A.M. Mahajan, Anil G. Khairnar, Brian J. Thibeault, "Pt-Ti/ALD-Al2O3/p-Si MOS capacitors for future ULSI technology", Journal of Nano-and Electronic Physics 3, 647-650 (2011).

24.	Yogesh S. Mhaisagar, Bhavana N. Joshi and A. M. Mahajan "Deposition and surface modification of low-k thin films for ILD application in ULSI circuits", Journal of Nano- and Electronic Physics 3, 99-103, (2011).

25.	Bhavana N. Joshi, Yogesh S. Mhaisagar and Ashok M. Mahajan, "Analysis of interconnect capacitance for sub nano CMOS technology using the low dielectric material", Microelectronics Reliability, 51 953-958, (2011) IF-1.202.

26.	Bhavana N. Joshi and A. M. Mahajan, "Deposition Characterization of Low-k Hybrid Thin Films Using Methyl Methacrylate for ULSI Applications", Materials Science and Engineering, B 168, 182-185, (2010) IF-3.42.

27.	Bhavana N. Joshi and A. M. Mahajan, "Sol gel deposited SiO2 and hybrid low dielectric constant thin films" Material Science in Semiconductor processing, 13(1), 41-45, (2010)  IF-2.26.

28.	Bhavana N. Joshi, M .A. More and A. M. Mahajan, "Growth and characterization of MMA / SiO2 hybrid low-k thin films for interlayer dielectric applications", Bulletin of Material Science, 33(3), 197-201, (2010) IF-0.89.

29.	Bhavana N. Joshi, Yogesh S. Mhaisagar and A.M. Mahajan, "Surface modification of porous SiO2 thin film by chemical treatment", Optoelectronics and Advanced Materials-Rapid communications, 4(9), 1304-1306, (2010) IF-0.41.

30.	Yogesh S. Mhaisagar, Bhavana N. Joshi, Preeti Jain, and A. M. Mahajan, Deposition of  Porous SiO2 thin films for enzyme immobilization in biosensor application" Bio-nano Frontiers special issue on Advancement in nanoscience for different technologies pp. 151-154. 13 (2010).

31.	Ravindrakumar G. Bavane, R.B. Gore and A.M. Mahajan, "Characterization of Polyaniline synthesized by Chemical synthesis technique" Bio-nano Frontiers special issue on Advancement in nanoscience for different technologies pp. 218-220 (2010).

32.	Fazal Noorbasha, Ashish Verma and A.M. Mahajan, "Study the Analysis of Low power and High speed CMOS Logic Circuits in 90nm Technology", e-Journal of Science and Technology, 143-50, (2010) IF- 1.12.

33.	Ravindra G. Bavane, Mahendra D. Shirsath and A.M. Mahajan, "Ammonia gas sensing characterization of chemically synthesized polyaniline matrix", Sensors & Transducers Journal, 113(2), 63-70, (2010) IF- 0.98.

34.	Anil B. Patil, A. M. Mahajan, "Synthesis and characterization of sol-gel derived CeO2 dielectric thin films for CMOS devices", Optoelectronics and Advanced Materials-Rapid communications, 2(12), 811-813, (2008) IF-0.41.

35.	Abhay G. Shrivas, A. M. Mahajan, "Effect of variation in preparation temperature on the conductivity of PANI", Optoelectronics and Advanced Materials-Rapid communications, 2(12), 859-862, (2008) IF-0.41.

36.	A. M. Mahajan, J. P. Bange, B. N. Joshi and D.K. Gautam "Growth of SiO2 films for microelectronics applications: Experimental and analytical study of the process parameters", African Physical Review 2 Special Issue (Microelectronics): 0028, 58-60 (2008) IF- 0.83.

37.	Bhavana N. Joshi and A.M. Mahajan, "Porous SiO2 thin films for ULSI applications", Presented in XIV International workshop on the Physics of Semiconductor Devices IWPSD 2007 held at IIT, Mumbai during 16th- 20th  Dec. 2007 Published in Proceedings on 261-263,ISBN: 978-1-4244-1728-5 (March-2008).

38.	Abhay Shrivas, R. G. Bavane and A.M. Mahajan,  "Electronic Nose: A Toxic gas sensor by Polyaniline Thin film conducting polymer", Presented in XIV International workshop on the Physics of Semiconductor Devices IWPSD 2007 held at IIT, Mumbai during 16th-20th Dec. 2007, Published in Proceedings on pp 621-623,ISBN: 978-1-4244-1728-5 (March-2008).

39.	Bhavana N. Joshi and A.M. Mahajan, "Synthesis and analysis of low-k material for intermetal dielectric applications in VLSI", Journal of Optoelectronics and Advanced Materials, 10(2), pp. 422-426, (2008) IF-0.29.

40.	A.  Sonanvane, B.  N. Joshi and A.M. Mahajan, "Analysis of capacitance across interconnects of low-k dielectric used in a deep sub-micron CMOS technology", Progress in Electromagnetics Research Letters 1, pp. 189-196, (2008) IF- 0.62.

41.	 B. N. Joshi and A. M. Mahajan, "Growth and Characterization of Porous SiO2 Thin Films for Interlayer Dielectrics Applications in ULSI", Optoelectronics and Advanced Materials-Rapid communications, 1(2), pp.  659-662, (2007) IF-0.41.

42.	A. M. Mahajan, L. S. Patil, J.P. Bange, and D. K. Gautam, "TEOS-PECVD deposition System for high growth rate deposition of SiO2 films.", Vacuum, 79/3-4, pp. 194-202, (2005)  IF- 1.55.

43.	A. M. Mahajan, L. S. Patil and D. K. Gautam, "Influence of process parameters on the properties of PECVD deposited SiO2 films", Surface and Coatings technology, 188/189C, pp. 314-318, (2004) IF-2.13.

44.	A M Mahajan, L S Patil, J P Bange& D K Gautam, "Growth of SiO2 films using TEOS-PECVD system for microelectronics applications", Surface Coating and Technology, 183/2-3, pp. 295-300, (2004) IF-2.13.

45.	R. K. Pandey, L. S. Patil, J. P. Bange, A. M. Mahajan and D.K. Gautam, "Growth and Characterization of SiON thin films by using thermal-CVD Machine", Optical Materials, 25(1) , pp. 1- 7, (2004)  IF-2.18.

46.	A. M. Mahajan, L. S. Patil, J.P. Bange, and D. K. Gautam "Growth and Characterization of SiO2 films for the fabrication of Optical Wave guides,", Journal of Optics, 31(2), pp. 53 -58, (2002).

47.	A M Mahajan, L S Patil, J P Bange& D K Gautam "Optimization of process parameters for the growth of SiO2 film using TEOS-PECVD system", Journal of Instrument Society of India (2002).

48.	A. B. Kadam and A. M. Mahajan, "Effect of positive feedback on the response of an Active "R" Filter", Journal of Instrument Society of India, 25(1&2), pp. 48-55, (1995).

49.	A. B. Kadam and A. M. Mahajan, "Performance of an active-R Filter in presence of positive feedback", Journal of Instrument Society of India, 24(1&2), pp. 35-41(1994).

Under Review

50.	Khushabu S. Agrawal, Vilas S. Patil, Anil G. Khairnar, and Ashok M. Mahajan "Structural and Electrical Properties of Sol-gel CeO2 Thin Films on Si (100) Substrate" revision submitted to Journal of sole gel science & technology (Springer) IF- 1.93.

51.	Anil S. Gaikwad, Yogesh S. Mhaisagar, Swati A. Gupta, Bhavana N. Joshi, Kandasami Asokan and Ashok M. Mahajan, "Amorphisation of SiO2 thin films by using 200MeV Ag15+ ions" submitted to Silicon (Springer) IF - 1.06.

52.	Vilas S. Patil, Khushabu S. Agrawal, Anil G. Khairnar, Brian J. Thibeault and Ashok M. Mahajan "Interfacial and Electrical Properties of Al2O3/HfO2 bilayer prepared by Atomic Layer Deposition on Plasma Annealed Germanium Surface" submitted to Materials Research Bulletin (Elsevier) IF - 2.48.

53.	Anil G. Khairnar and Ashok M. Mahajan "Effect of post-deposition annealing temperature on high permittivity HfO2 based gate stack on surface passivated germanium" submitted to Bulletin of Materials Science IF-0.89.

54.	Anil G. Khairnar and Ashok M. Mahajan "Effect of post-deposition annealing temperature on high permittivity HfO2 based gate stack on surface passivated germanium" submitted to Bulletin of Materials Science IF-0.89

     

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