Research Area

  • Low dielectric thin films, high dielectric thin film growth and characterization, MIS structures, Novel High-K / Metal Gate stacks, MOS capacitors for advanced CMOS technology.
  • Modeling and simulation of CMOS nano devices & Processes for future ULSI technology.
  • Reliability issues of the novel materials and nano devices
  • Synthesis and characterization of nano materials.
  • Organic semiconductor devices.


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