Research Area
- Low dielectric thin films, high dielectric thin film growth and characterization, MIS structures, Novel High-K / Metal Gate stacks, MOS capacitors for advanced CMOS technology.
- Modeling and simulation of CMOS nano devices & Processes for future ULSI technology.
- Reliability issues of the novel materials and nano devices
- Synthesis and characterization of nano materials.
- Organic semiconductor devices.
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