Research Experience (25+ Years)
Master of Philosophy in Electronics (M.Phil.):Dissertation Title: "Design and Investigation of Some Active R filter configuration" (1992-94)
Doctor of Philosophy (Ph. D.) (1998-2003) Ph.D. Thesis: "FABRICATION OF PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM AND GROWTH OF THIN FILMS USING PECVD"

Hands on Research Experience:

• In designing and commissioning of Thermal CVD, PECVD Machines.
• In simulation and optimization of the process parameters.
• Deposition of thin films like SiO2, SiON and SiN using Thermal CVD & PECVD.
• An exposure is taken towards Atomic Layer Deposition ( ALD) of High K Materials of very few nm thicknesses, at Materials and devices laboratory for Microelectronics i.e. MDM Lab at Agrate Brianza, Milan, Italy during my last visit of 2 days in Dec-06.

Capable of handling (working with) the following sophisticated characterization equipments:

• Ellipsometer (Philips SD-1000),
• FTIR Spectrophotometer (Shimadzu-8400, Nicolet 380),
• Optical microscope, SEM , EDAX, TEM, XRD , UV VIS Spectrophotometer etc.
• Working ability in Clean room environment.
• Gained expertise in the chemical treatment of Silicon wafers required prior to processing.
• Gained experience on Photolithographic techniques
• Guided (Research based project) Master (M.Sc.) thesis: 100
• Evaluated (Research based project) Master thesis as an examiner: 50

Current Research Interest:

• Deposition of high-k dielectric thin films (by PEALD, RF-Sputtering),fabrication of novel High-k / Metal Gate stacks on Si, Ge & compound semiconductors, MOS capacitors and characterization for advanced CMOS technology (FEOL).
• Fabrication of high-k/2D (or 2D/high-k) based MOS capacitors Optoelectronics applications
• Fabrication of novel high-k nanolaminated MIM structures for Memoristors/RF applications
• Fabrication and Characterization of 2D transition metal dichalcogenides (TMDs) based metal oxide semiconductor devices
• Deposition of low dielectric thin films, Aerogel, Xerogel, Surfactant and Porogen based low-k thin films on Si substrates and their characterization, fabrication of MIS structures for ULSI technology (BEOL).
• Investigation of novel rare earth oxide materials for nano devices for future ULSI technology.
• Polymer based gas sensors.
• Deposition of high-k dielectric thin films (by PEALD, RF-Sputtering),fabrication of novel High-k / Metal Gate stacks on Si, Ge & compound semiconductors, MOS capacitors and characterization for advanced CMOS technology (FEOL).
• Fabrication of high-k/2D (or 2D/high-k) based MOS capacitors Optoelectronics applications
• Fabrication of novel high-k nanolaminated MIM structures for Memoristors/RF applications
• Fabrication and Characterization of 2D transition metal dichalcogenides (TMDs) based metal oxide semiconductor devices
• Deposition of low dielectric thin films, Aerogel, Xerogel, Surfactant and Porogen based low-k thin films on Si substrates and their characterization, fabrication of MIS structures for ULSI technology (BEOL).
• Investigation of novel rare earth oxide materials for nano devices for future ULSI technology.
• Polymer based gas sensors.