On Going Projects
- An innovative interfacial control layer on Ge channel substrate for the effective fabrication and integration of novel “Ge/ALD High-k/capping layer/ Metal (bilayer) Gate stacks” for future nanoelectronics applications
- Deposition and characterization of silica aerogel low-k thin films as interlayer dielectric (ILD) in ULSI circuits
- Investigation of radiation effect on low dielectric thin films for CMOS/VLSI technology Fabrication and characterization of novel “Ge/high-k/capping layer/Metal (bilayer) Gate stacks” for advanced CMOS technology
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